Vessel cover check device of semiconductor wafer cleaning equipment
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机译:半导体晶片清洗设备的容器盖检查装置
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摘要
The present invention relates to a device for confirming the opening and closing of the cover of a semiconductor wafer cleaning device. In the related art, the robot arm and the wafer chuck are designed to enter the inside of the cleaning bath after the cover is opened, but the opening and closing of the cover is confirmed. The robot arm and the wafer chuck attempt to enter the inside of the bath while the base cover is not fully opened due to a failure of the magnetic sensor or the misalignment of the sensor and the loosening of the linkage connecting the base and the cylinder. In the present invention, there is a concern that the present invention includes a vessel cover for opening and closing an inlet portion of the wafer cleaning bath, an air cylinder coupled to the vessel cover and interlocking members to drive the vessel cover, an operation degree of the cylinder and access to the vessel cover. It comprises a recognition unit for determining the opening and closing of the cover according to the degree Writing, there is an effect that it is possible to prevent in advance to correctly identify the opening and closing state of the bath cover a robot arm and the wafer chuck is hit damage to the bath cover.
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