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Vessel cover check device of semiconductor wafer cleaning equipment

机译:半导体晶片清洗设备的容器盖检查装置

摘要

The present invention relates to a device for confirming the opening and closing of the cover of a semiconductor wafer cleaning device. In the related art, the robot arm and the wafer chuck are designed to enter the inside of the cleaning bath after the cover is opened, but the opening and closing of the cover is confirmed. The robot arm and the wafer chuck attempt to enter the inside of the bath while the base cover is not fully opened due to a failure of the magnetic sensor or the misalignment of the sensor and the loosening of the linkage connecting the base and the cylinder. In the present invention, there is a concern that the present invention includes a vessel cover for opening and closing an inlet portion of the wafer cleaning bath, an air cylinder coupled to the vessel cover and interlocking members to drive the vessel cover, an operation degree of the cylinder and access to the vessel cover. It comprises a recognition unit for determining the opening and closing of the cover according to the degree Writing, there is an effect that it is possible to prevent in advance to correctly identify the opening and closing state of the bath cover a robot arm and the wafer chuck is hit damage to the bath cover.
机译:用于确认半导体晶片清洁装置的盖的打开和关闭的装置技术领域本发明涉及一种用于确认半导体晶片清洁装置的盖的打开和关闭的装置。在现有技术中,机械手和晶片卡盘被设计成在盖打开之后进入清洁槽的内部,但是确认了盖的打开和关闭。由于磁传感器故障或传感器未对准以及连接基座和气缸的联动装置松动而导致底盖未完全打开时,机械手和晶片吸盘试图进入熔池内部。在本发明中,存在如下问题:本发明包括:用于打开和关闭晶片清洁浴的入口部的容器盖;联接至容器盖的气缸;以及用于驱动容器盖的联锁构件;操作程度缸的顶部,并进入容器盖。它包括用于根据书写程度确定盖的打开和关闭的识别单元,具有可以预先防止正确识别浴盖的打开和关闭状态的作用,该效果是机械臂和晶片卡盘被击中损坏了浴盖。

著录项

  • 公开/公告号KR200315064Y1

    专利类型

  • 公开/公告日2003-07-16

    原文格式PDF

  • 申请/专利权人 주식회사 하이닉스반도체;

    申请/专利号KR19980004194U

  • 发明设计人 신진욱;

    申请日1998-03-20

  • 分类号H01L21/304;

  • 国家 KR

  • 入库时间 2022-08-21 23:44:36

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