首页> 外国专利> MANUFACTURING METHOD OF COATING SOLUTION FOR LOW TRANSMISSION ANTISTATIC FILM FORMATION, LOW TRANSMISSION ANTISTATIC FILM TO WHICH THIS COATING SOLUTION IS APPLIED, AND LOW TRANSMISSION ANTISTATIC SUBSTRATE, AND DISPLAY DEVICE TO WHICH THIS SUBSTRATE ARE APPLIED

MANUFACTURING METHOD OF COATING SOLUTION FOR LOW TRANSMISSION ANTISTATIC FILM FORMATION, LOW TRANSMISSION ANTISTATIC FILM TO WHICH THIS COATING SOLUTION IS APPLIED, AND LOW TRANSMISSION ANTISTATIC SUBSTRATE, AND DISPLAY DEVICE TO WHICH THIS SUBSTRATE ARE APPLIED

机译:低透射率抗静电膜形成,低透射率抗静电膜的涂层解决方案的制造方法,适用于该涂层溶液的低透射率抗静电膜,低透射率的抗静电基质,以及用于显示该基质的显示装置

摘要

PROBLEM TO BE SOLVED: To provide a coating solution for a low transmission factor antistatic film forming in which a superior permeation color from a black to a blue black system in addition to an electroconductive and a low permeability is obtained, a low transmission factor antistatic film, a manufacturing method of a low transmission factor antistatic substrate, and a display device applied to this substrate.;SOLUTION: As a solid content homogeneously dispersed in a polarity solvent, this coating solution for the low transmission factor antistatic film forming contains a complex oxide of an iron of an average particle diameter 10-200 nm, a copper, and manganese of 0.2-2.0 wt%, a color pigment of a cyanine blue or the like of the average particle diameter 10-200 nm of 0.5 wt% or less, an electroconductive pigment of the average particle diameter 10-200 nm of 0.4-4.0 wt%, a hydrolyzate of alkyl sequence of 0.4-4.0 wt% by SiO2 conversion.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:为了提供一种用于低透射率抗静电膜形成的涂料溶液,其中除了导电性和低渗透性之外,还获得了从黑色到蓝黑系统的优异渗透色,低透射率抗静电膜,低透射率抗静电基板的制造方法以及应用于该基板的显示装置。解决方案:由于固体成分均匀地分散在极性溶剂中,该低透射率抗静电膜形成用涂布液包含复合氧化物。平均粒径为10〜200nm的铁,铜和锰为0.2〜2.0wt%,平均粒径为10〜200nm的花青蓝等的着色颜料的含量为0.5wt%以下。 ,平均粒径10-200 nm的导电颜料为0.4-4.0 wt%,通过SiO 2 转换得到的烷基序列为0.4-4.0 wt%的水解产物。;版权:(C)2004 ,日本特许厅

著录项

  • 公开/公告号JP2004055448A

    专利类型

  • 公开/公告日2004-02-19

    原文格式PDF

  • 申请/专利权人 SUMITOMO METAL MINING CO LTD;

    申请/专利号JP20020214083

  • 发明设计人 OTSUKA YOSHIHIRO;

    申请日2002-07-23

  • 分类号H01J9/20;C03C17/30;C09D1/00;C09D5/24;H01J29/88;H05F1/00;

  • 国家 JP

  • 入库时间 2022-08-21 23:30:29

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