METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING PATTERNED THIN FILM, METHOD FOR MANUFACTURING MICRODEVICE, METHOD FOR MANUFACTURING THIN FILM MAGNETIC HEAD,

摘要

PROBLEM TO BE SOLVED: To provide a method for forming resist patterns having slits, a method for forming patterned thin films, a method for manufacturing a microdevice, a method for manufacturing a thin-film magnetic head, a method for manufacturing a magnetic head slider, a method for manufacturing a magnetic head system, and a method for manufacturing a magnetic recording and reproducing device.;SOLUTION: Since the second resist patterns are irradiated with electron beams, the second resist patterns are crosslinked and cured. The mechanical strength and heat resistance of the second resist patterns are strengthened and hence the portions of the second resist patterns facing a substrate with the spacing interposed therebetween are hardly deformed. As a result, the resist patterns having high accuracy are obtained and the yield in subsequent manufacturing processes can be improved. Also, the formation of the fine resist patterns is made possible.;COPYRIGHT: (C)2004,JPO