The dissolution inhibiter of the chemical amplification die photoresist and the chemical amplification die photoresist constituent null which includes

摘要

A dissolution inhibitor for use in a chemically amplified photoresist, and a chemically amplified photoresist composition containing the same are provided. The dissolution inhibitor is a compound in which an acid-labile di-alkylmalonate group is combined as a functional group with a C1 to C20 hydrocarbon. The chemically amplified photoresist composition containing the dissolution inhibitor has a high contrast and high thermal decomposition temperature, making it suitable for forming a fine pattern having excellent profile.