Adjustment manner, aberration measuring method and aberration measurement mark null of alignment

摘要

In an alignment apparatus, an alignment mark formed on a substrate is illuminated through an illuminating optical system, and an image of the alignment mark is projected onto a light receiving surface of a CCD camera through an enlarging optical system. The enlarging optical system includes a parallel flat plate, the inclination of which can be adjustable, for parallel-translating an eccentric component of coma.