Passivating inorganic bottom anti-reflective coating (BARC) using rapid thermal anneal (RTA) with oxidizing gas

摘要

A method is provided, the method including forming a gate dielectric layer above a substrate layer and forming a gate conductor layer above the gate dielectric layer. The method also includes forming an inorganic bottom anti-reflective coating layer above the gate conductor layer and treating the inorganic bottom anti-reflective coating layer with an oxidizing treatment during a rapid thermal anneal process.