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Attenuated phase shift mask for use in EUV lithography and a method of making such a mask
Attenuated phase shift mask for use in EUV lithography and a method of making such a mask
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机译:用于EUV光刻的衰减型相移掩模及其制造方法
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摘要
An attenuated phase shift mask utilizes a multilayer which has been locally modified. Heat treatment or e-beam treatment can locally modify the multilayer to provide different reflective characteristics. The attenuated phase shift mask can be utilized in EUV applications.
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