首页> 外国专利> THIN FILM INTEGRATED CIRCUIT DEVICE WITH THIN FILM INTEGRATED CIRCUIT, IC LABEL, CONTAINER, METHOD FOR FABRICATING SUCH THIN FILM INTEGRATED CIRCUIT DEVICE, METHOD FOR FABRICATING SUCH CONTAINER AND METHOD FOR CONTROLLING PRODUCT WITH SUCH CONTAINER TO STORE LOTS OF INFORMATION EVEN THOUGH HAVING THICKNESS SMALLER THAN THAT OF CONVENTIONAL SILICON WAFER

THIN FILM INTEGRATED CIRCUIT DEVICE WITH THIN FILM INTEGRATED CIRCUIT, IC LABEL, CONTAINER, METHOD FOR FABRICATING SUCH THIN FILM INTEGRATED CIRCUIT DEVICE, METHOD FOR FABRICATING SUCH CONTAINER AND METHOD FOR CONTROLLING PRODUCT WITH SUCH CONTAINER TO STORE LOTS OF INFORMATION EVEN THOUGH HAVING THICKNESS SMALLER THAN THAT OF CONVENTIONAL SILICON WAFER

机译:具有薄膜集成电路的薄膜集成电路设备,IC标签,容器,用于制造这种薄膜集成电路设备的方法,用于制造这种容器的方法以及用于控制具有多个这样的容器的产品,以保持大量的信息常规硅片

摘要

PURPOSE: A thin film integrated circuit device is provided to rapidly and easily exchange or manage information by having a very small thickness, and to supply various information to anyone. CONSTITUTION: An insulation layer is prepared. A plurality of mutually insulated semiconductor layers are formed on a part of the surface of the insulation layer. A thin film integrated circuit includes the plurality of semiconductor layers. A metal oxide is formed on another surface of the insulation layer. The metal oxide includes WO2 or WO3.
机译:目的:提供一种薄膜集成电路器件,以通过非常小的厚度来快速且容易地交换或管理信息,并将各种信息提供给任何人。构成:准备好绝缘层。在绝缘层的一部分表面上形成有多个相互绝缘的半导体层。薄膜集成电路包括多个半导体层。在绝缘层的另一表面上形成金属氧化物。金属氧化物包括WO 2或WO 3。

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