Purpose: being arranged to predict the geomorphology of a substrate using a sputter process simulation of a Monte Carlo Method, by considering a scattering effect between the calculating of target atoms and target atoms discharge distribution. Construction: a simulator apparatus is on a processor and executes a reset process (201). Processor executes a calculation process. Each processor calculates an entry target information from an input varible (203). Each processor calculates stop force before an ion implantation process is performed (204). Ion implantation process is performed (205). Each processor calculates the track of all atoms (206). Each processor calculates a conflict phenomenon by using chain collision algorithm (207). Injectant ion energy sources are compared with the predetermined energy of target (208). When injectant ion energy sources are less than the predetermined energy of target (209), ion is implanted. The output result of each processor is formed after simulation process completes (210). Output result is sent to a central processing unit (211). The central processing unit processing output result and result of transmission process is to a kind of postprocess systems (212).
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