THIN FILM OXIDE DEPOSITION METHOD FOR PLASMA DISPLAY PANEL CAPABLE OF AVOIDING DAMAGES DUE TO USE OF ION

摘要

PURPOSE: A thin film oxide deposition method is provided to prevent damages caused due to use of ion and degradation of vacuum level caused due to increase of O2. CONSTITUTION: A thin film oxide deposition method comprises a step of mounting a substrate in a chamber(700); a step of maintaining the chamber at a vacuum state, and forming O2 atmosphere in the chamber by injecting small amount of O2 gas in the chamber; a step of forming an ionized £O| atmosphere in the chamber by radiating a UV lamp(500) in the chamber and generating ionized £O|; and a step of depositing, on the substrate, the material evaporated from a deposition material source together with the £O| which is dissociated in the ionized £O| atmosphere.