1,2-NAPHTHOQUINONE-2-DIAZIDESULFONATE-BASED SENSITIZER SHOWING NO I-LINE ABSORPTION AND HAVING IMPROVED SOLUBILITY AND PHOTORESIST COMPOSITION CONTAINING THE SENSITIZER

摘要

PURPOSE: Provided are a 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer which can be prepared by easily, shows no i-line absorption and is improved in solubility by converting some of the hydroxyl group of a cyclic polyhydroxy compound into a 1,2-naphthoquinone-2-diazidesulfonyl group and an arylsulfonyl group and a photoresist composition containing the sensitizer which is improved in the sensitivity and the ratio of residual layers. CONSTITUTION: The 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer is represented by the formula 1, wherein R1, R2, R3 and R4 are independently C2-C9 alkyl group; and D1 to D8 are independently one another, at least two of them are a 1,2-naphthoquinone-2-diazidesulfonyl group, at least one of the rest is an arylsulfonyl group and the rest are H. The photoresist composition comprises the 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer of the formula 1; and an alkali-soluble resin.