Exposure device with inclination control device, surface positioning device, rear surface positioning device, and device manufactured using these devices

摘要

The table supporting the substrate is located on the focusing and leveling stage through three points, the calculator accepts as input the coordinate values of the table measured by the interferometer, and a predetermined reference plane at the surface of the wafer and at each of the various measuring points on the substrate. Since the position deviation amount between is measured by the multi-point AF sensor and the weight constant is given as the position deviation amount at each of the plurality of measurement points, the residual deviation is calculated at each of the three points. The controller adopts a PID control system and controls the displacement amounts of the three points based on the residual deviation calculated by the calculator, the integral value of the residual deviation and the derivative value of the residual deviation.