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Thermal stress absorbing interface structure and semiconductor assembly using the same and method for manufacturing the same

机译:吸收热应力的界面结构和使用该结构的半导体组件及其制造方法

摘要

A thermal-stress-absorbing interface structure between a semiconductor integrated circuit chip and a surface-mount structure and a method for manufacturing the same. The thermal-stress-absorbing interface structure comprises an elongated conductive-bump pad having a first length-wise end and a second length-wise end, and a side. The thermal-stress-absorbing interface structure includes means for allowing the first end of the pad to move up when the second end of the pad moves down and alternately allowing the first end to move down when the second end moves up, upon thermal cycling. The means has a center axis and the up-and-down movements of the pad are balanced on the center axis. In accordance with this novel structure of the present invention, interconnection reliability such as solder joint reliability can be significantly improved.
机译:半导体集成电路芯片和表面安装结构之间的热应力吸收界面结构及其制造方法。吸收热应力的界面结构包括细长的导电凸块垫,该凸块具有第一纵向端和第二纵向端以及一侧。吸收热应力的界面结构包括用于在热循环时当垫的第二端向下移动时允许垫的第一端向上移动并且当第二端向上移动时允许第一端向下移动的装置。该装置具有中心轴,并且垫的上下运动在中心轴上平衡。根据本发明的这种新颖结构,可以显着提高互连可靠性,例如焊点可靠性。

著录项

  • 公开/公告号KR100418600B1

    专利类型

  • 公开/公告日2004-02-11

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20010016168

  • 发明设计人 김구성;장동현;손민영;강사윤;

    申请日2001-03-28

  • 分类号H01L23/13;

  • 国家 KR

  • 入库时间 2022-08-21 22:47:30

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