Process for forming a matrix arrangement of exposure fields on an idealized semiconductor wafer in integrated circuit production compares peripheral parameters with a quality reference

摘要

A process for forming a matrix of exposure fields (5) on an idealized semiconductor wafer (1) in integrated circuit production comprises giving external (20,21) and field sizes, fixing a reference coordinate, choosing a field only partly in the wafer and comparing a quality parameter for this with a reference in order to retain or discard this field.