首页> 外国专利> OPTICAL CHARACTERISTIC ANALYSIS SYSTEM OF OPTICAL INSTRUMENT, OPTICAL CHARACTERISTIC ANALYZING METHOD, ITS PROGRAM, AND OPTICAL COMPONENTS MANUFACTURED BY ITS METHOD

OPTICAL CHARACTERISTIC ANALYSIS SYSTEM OF OPTICAL INSTRUMENT, OPTICAL CHARACTERISTIC ANALYZING METHOD, ITS PROGRAM, AND OPTICAL COMPONENTS MANUFACTURED BY ITS METHOD

机译:光学仪器的光学特性分析系统,光学特性分析方法,其程序以及由该方法制造的光学部件

摘要

PROBLEM TO BE SOLVED: To provide an optical characteristic analysis system which can grasp correctly the influence of deformation caused by mechanical or thermal behaviors, by suppressing shape deviation of the optical surface in the case of performing a simulation.;SOLUTION: The shape of an optical system designed on the basis of design formula with optical design tools is inputted into a deformation-analysis tool so as to investigate mechanical or thermal behaviors. In the case of searching for a more optimal shape of the optical system from the state of deformation, a higher-precision simulation result can be obtained in modeling of a deformation-analysis tool, in such a way that the model generated coarsely is amended based on a design formula, and numerical analysis is conducted about the amended model.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:要解决的问题:提供一种光学特性分析系统,通过在执行模拟的情况下抑制光学表面的形状偏差,可以正确地把握由机械或热行为引起的变形的影响。将使用光学设计工具根据设计公式设计的光学系统输入到变形分析工具中,以研究机械或热行为。在从变形的状态中寻找光学系统的最佳形状的情况下,在变形分析工具的建模中可以获得较高的仿真结果,从而可以对基于粗略生成的模型进行修正。设计公式,并对修正后的模型进行数值分析。;版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005172545A

    专利类型

  • 公开/公告日2005-06-30

    原文格式PDF

  • 申请/专利权人 OLYMPUS CORP;

    申请/专利号JP20030411352

  • 申请日2003-12-10

  • 分类号G01M11/02;G01B21/20;G06F17/50;

  • 国家 JP

  • 入库时间 2022-08-21 22:32:55

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