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Detecting erosion in collector optics with plasma sources in extreme ultraviolet (EUV) lithography systems
Detecting erosion in collector optics with plasma sources in extreme ultraviolet (EUV) lithography systems
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机译:在极紫外(EUV)光刻系统中使用等离子源检测集光器光学器件中的腐蚀
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摘要
An embodiment of the present invention includes a technique to detect erosion in an extreme ultra violet (EUV) source collector system. An initial impedance and a coating impedance of a multi-layer (ML) coating of the collector in one of an extreme ultra violet lithography (EUVL) stepper and an optical system are obtained at first and second time instants. A relation between the coating and initial impedances is generated. An erosion rate of the ML coating is determined based on the relation.
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