首页> 外国专利> Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources

Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources

机译:用于激光等离子极紫外(EUV)光源的耐腐蚀喷嘴

摘要

A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10. sup.7 Xe plasma pulses.
机译:具有提高的抵抗由激光等离子体源产生的高能等离子体颗粒腐蚀的气体喷嘴。通过将喷嘴的面向等离子体的部分的面积减小到临界尺寸以下,并且由具有高EUV透射率以及低溅射系数的材料(例如Be,C或Si)来制造喷嘴,已经表明即使在将喷嘴暴露于至少10个sup.7 Xe等离子体脉冲后,也可以显着降低附近光学组件的反射损失。

著录项

  • 公开/公告号US6011267A

    专利类型

  • 公开/公告日2000-01-04

    原文格式PDF

  • 申请/专利权人 EUV LLC;

    申请/专利号US19980032224

  • 发明设计人 GLENN D. KUBIAK;LUIS J. BERNARDEZ II;

    申请日1998-02-27

  • 分类号H01J27/00;G01G4/00;

  • 国家 US

  • 入库时间 2022-08-22 01:38:23

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号