Chemically amplified negative photoresist, and photoresist composition

摘要

A polymer for a chemically amplified negative photoresist and a photoresist composition are provided. A representative polymer of the invention is a compound of formula 5: wherein: R₁ through R₅ and R₁₄ through R₁₇ are defined as set fourth in the specification, and a, b, c, and d represent the mole ratios of each monomer, wherein a has a value of 0-0.5, b has a value of 0-0.9, c has a value of 0-0.3, and d has a value of 0-0.3, provided that a+b+c+d=1; and n represents the degree of polymerization of each polymer, and has a value of at least 2.