首页> 外国专利> Optical compensation in high numerical aperture photomask inspection systems for inspecting photomasks through thick pellicles

Optical compensation in high numerical aperture photomask inspection systems for inspecting photomasks through thick pellicles

机译:高数值孔径光掩模检查系统中的光学补偿,用于通过厚薄膜来检查光掩模

摘要

An objective lens system having reconfigurable optical components that enable the inspection of inspection surfaces in the absence of a pellicle or through a thin membrane pellicle, and using the same system, also enabling the inspection of inspection surfaces through a thick pellicle. An objective lens system includes a first group and a second group of optical elements. The first group of optical elements enables high numerical aperture and beam contraction. The second group of optical elements is capable of two mode operation enabling, in one mode, inspection through a thin membrane pellicle or in the absence of a pellicle and in another mode, enabling inspection through a thick pellicle. The system can also be enhanced through the use of an interposable aberration corrector plate that is used to correct optical aberrations caused by the presence, absence, or thickness of pellicles.
机译:一种物镜系统具有可重构光学组件,该光学组件能够在没有防护膜或通过薄膜防护膜的情况下检查检查表面,并且使用相同的系统,还能够通过厚防护膜进行检查表面的检查。物镜系统包括第一组和第二组光学元件。第一组光学元件可实现较高的数值孔径和光束收缩。第二组光学元件能够进行两种模式的操作,在一种模式下,能够通过薄膜薄膜或在没有薄膜的情况下进行检查,而在另一种模式下,能够通过较厚的薄膜进行检查。该系统还可以通过使用可插入的像差校正板来增强,该校正板用于校正由薄膜的存在,不存在或厚度引起的光学像差。

著录项

  • 公开/公告号US6952256B2

    专利类型

  • 公开/公告日2005-10-04

    原文格式PDF

  • 申请/专利权人 RONALD L. RONCONE;DAMON KVAMME;

    申请/专利号US20030401614

  • 发明设计人 RONALD L. RONCONE;DAMON KVAMME;

    申请日2003-03-27

  • 分类号G01N21/88;

  • 国家 US

  • 入库时间 2022-08-21 22:19:40

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