首页> 外国专利> OPTICAL COMPENSATION IN HIGH NUMERICAL APERTURE PHOTOMASK INSPECTION SYSTEMS FOR INSPECTING PHOTOMASKS THROUGH THICK PELLICLES

OPTICAL COMPENSATION IN HIGH NUMERICAL APERTURE PHOTOMASK INSPECTION SYSTEMS FOR INSPECTING PHOTOMASKS THROUGH THICK PELLICLES

机译:用于通过厚颗粒检查光斑的高数值孔径光罩检查系统中的光学补偿

摘要

An objective lens system (201) having reconfigurable optical components that enable the inspection of inspection surfaces in the absence of a pellicle or through a thin membrane pellicle, and using the same system, also enabling the inspection of inspection surfaces through a thick pellicle. An objective lens system includes a first group (202) and a second group (203) of optical elements. The first group (201) of optical elements enables high numerical aperture and beam contraction. The second group (203) of optical elements is capable of two mode operation enabling, in one mode, inspection through a thin membrane pellicle or in the absence of a pellicle and in another mode, enabling inspection through a thick pellicle. The system can also be enhanced through the use of an interposable aberration corrector plate that is used to correct optical aberrations caused by the presence, absence, or thickness of pellicles.
机译:物镜系统(201)具有可重构光学部件,该光学部件能够在没有防护膜或通过薄膜防护膜的情况下检查检查表面,并且使用相同的系统,还能够通过厚防护膜进行检查表面的检查。物镜系统包括第一组(202)和第二组(203)光学元件。第一组光学元件(201)能够实现高数值孔径和光束收缩。光学元件的第二组(203)能够进行两种模式的操作,在一种模式下,能够通过薄膜薄膜或在没有薄膜的情况下进行检查,而在另一种模式下,能够通过较厚的薄膜进行检查。该系统还可以通过使用可插入的像差校正板来增强,该校正板用于校正由薄膜的存在,不存在或厚度引起的光学像差。

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