Mirror device, mirror adjustment method, exposure apparatus, exposure method, and semiconductor device manufacturing method

摘要

A mirror device having an optical system of an exposure apparatus for transferring a reticle pattern onto a wafer includes a mirror, a mirror holding portion, a temperature adjustment unit, a control management database, and a timing control unit. The mirror reflects exposure light, and the mirror holding portion holds the mirror. The temperature adjustment unit adjusts a temperature of the mirror and the mirror holding portion. The control management database stores data corresponding to a controlling rule of the temperature adjustment unit necessary to keep the mirror figure constant for an incidence condition of the reflected exposure light. The timing control unit controls the temperature adjustment unit corresponding to the incidence condition of the exposure light. The timing control unit controls the temperature adjustment unit based on the stored data of the control management database to keep the mirror figure constant.