SEMICONDUCTOR SUBSTRATE INCLUDING SEMICONDUCTOR LAYER, POROUS LAYER FOR SUPPORTING SEMICONDUCTOR LAYER, AND STRAIN INDUCING REGION FOR STRAINING SEMICONDUCTOR LAYER BY APPLYING STRESS TO SEMICONDUCTOR LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING THE SAME

摘要

PURPOSE: A semiconductor substrate, a semiconductor device, and a method of manufacturing the same are provided to strain efficiently a semiconductor layer or a semiconductor region by using a strain inducing region. CONSTITUTION: A porous layer(12) is used for supporting a semiconductor layer(13). A strain inducing region(14) is used for straining the semiconductor layer by applying stress to the semiconductor layer. The porous layer and the semiconductor layer include a plurality of island-shaped regions. The strain inducing region is formed between the island-shaped regions. The semiconductor layer includes a plurality of island-shaped semiconductor regions. The strain inducing region is formed between the island-shaped semiconductor regions.