首页> 外国专利> TRANSFER SYSTEM FOR SUPPORTING ETCH CHAMBER IRRESPECTIVE OF SEVERANCE OF WIRE FOR ELEVATING ETCH CHAMBER IN ETCHING PROCESS

TRANSFER SYSTEM FOR SUPPORTING ETCH CHAMBER IRRESPECTIVE OF SEVERANCE OF WIRE FOR ELEVATING ETCH CHAMBER IN ETCHING PROCESS

机译:支持蚀刻腔室的传输系统,在蚀刻过程中提高钢丝腔室的绝缘层的强度

摘要

PURPOSE: A transfer system of an etch chamber is provided to support the etch chamber irrespective of severance of elevating wires by using an auxiliary wire as well as the elevating wires. CONSTITUTION: A chamber supporting plate(200) is located on a chamber and includes a plurality of fixing holes which are connected to a chamber supporting wire, an elevating wire, and an auxiliary wire. An elevation device includes a plurality of motors(M1,M3) installed at an upper part of the chamber supporting plate, a driving gear coupled to a driving shaft of each of the motors, a first driven gear coupled to the driving gear, a plurality of bobbins, a first rotary shaft, a first driven shaft gear, a second driven gear coupled to the first driven shaft gear, a second rotary shaft, and a bracket installed at a lower part of a base panel. A horizontal moving device(300) includes an X-axis transfer shaft(310) and a Y-axis transfer shaft(320). A supporting frame is used for supporting the horizontal moving device.
机译:目的:提供蚀刻室的传送系统以通过使用辅助线和升降线而与升降线的切断无关地支撑蚀刻室。构成:腔室支撑板(200)位于腔室上,并包括多个固定孔,所述固定孔连接至腔室支撑线,升降线和辅助线。一种升降装置,包括安装在腔室支撑板的上部的多个马达(M1,M3),与各马达的驱动轴连接的驱动齿轮,与该驱动齿轮连接的第一从动齿轮,多个线轴,第一旋转轴,第一从动轴齿轮,联接到第一从动轴齿轮的第二从动齿轮,第二旋转轴以及安装在底板下部的支架构成。水平移动装置(300)包括X轴传动轴(310)和Y轴传动轴(320)。支撑架用于支撑水平移动装置。

著录项

  • 公开/公告号KR20040105630A

    专利类型

  • 公开/公告日2004-12-16

    原文格式PDF

  • 申请/专利权人 YOUN HYUN SUK;

    申请/专利号KR20040050940

  • 发明设计人 YOUN HYUN SUK;

    申请日2004-07-01

  • 分类号H01L21/3065;

  • 国家 KR

  • 入库时间 2022-08-21 22:06:21

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