首页> 外国专利> A FRICTION MEMBER COATED DIAMOND PHASE CARBON FILM DOPED WITH SILICON AND THE MANUFACTURING METHOD FOR THE SAME

A FRICTION MEMBER COATED DIAMOND PHASE CARBON FILM DOPED WITH SILICON AND THE MANUFACTURING METHOD FOR THE SAME

机译:掺有硅的摩擦膜包覆金刚石相碳膜及其制造方法

摘要

A frictional member having diamond-phase carbon thin film coating doped with silicon on friction surface of a crude material and a process for manufacturing the same are provided for achieving excellent lubrication of the member, thereby increasing durability of mechanical parts. The member is produced by the process comprising steps of: placing a crude material(1) on a base plate(130) after washing the material with deionized water; etching a surface of the crude material to be coated by operating an ion gun(110) for 10-40 minutes while applying a bias voltage of -10 to -1000V on the plate(130) and feeding argon gas from a gas feeding part(150) into a chamber(100); a pre-vapor deposition for forming a silicon layer over the crude material(1) using a sputtering gun(120) under argon gas and at 0.5-2m Torr pressure; and a vapor deposition for coating the crude material(1) with a diamond-phase carbon thin film doped with silicon using the ion gun(100) under hydrocarbon and Si containing gas at 10-100m Torr to generate carbon plasma.
机译:提供一种在原材料的摩擦表面上具有掺杂有硅的金刚石相碳薄膜涂层的摩擦构件及其制造方法,以实现该构件的优异润滑,从而提高机械零件的耐久性。该构件通过包括以下步骤的方法生产:在用去离子水洗涤原料之后,将原料(1)放置在基板(130)上;通过在板(130)上施加-10到-1000V的偏压并从气体进料部分进料氩气的同时,通过操作离子枪(110)10-40分钟来蚀刻要涂覆的粗材料的表面, 150)进入腔室(100);用于在氩气和0.5-2m Torr压力下使用溅射枪(120)在粗材料(1)上形成硅层的预汽相沉积;然后通过离子枪(100)在碳氢化合物和含Si的气体中,在10-100m Torr下,用掺有硅的金刚石相碳薄膜涂覆粗材料(1),进行气相沉积,以产生碳等离子体。

著录项

  • 公开/公告号KR20050033779A

    专利类型

  • 公开/公告日2005-04-13

    原文格式PDF

  • 申请/专利权人 J&L TECH CO. LTD.;JUN YOUNG HA;

    申请/专利号KR20030069716

  • 发明设计人 JUN YOUNG HA;

    申请日2003-10-07

  • 分类号B32B9/04;

  • 国家 KR

  • 入库时间 2022-08-21 22:05:36

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