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Manufacturing method of silicon tip field emitter coated with diamond carbon thin film
Manufacturing method of silicon tip field emitter coated with diamond carbon thin film
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机译:金刚石碳薄膜涂覆的硅尖场发射极的制造方法
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摘要
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to tripolar silicon tip field emitters used in field emission display devices, and more particularly by uniformly coating a diamond-like carbon thin film on the silicon tip surface of a tripolar silicon tip field emitter without breaking the tip. The present invention relates to a method for fabricating a silicon tip field emitter with improved current-voltage characteristics, emission current density and lifetime.
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