MANUFACTURING PROCESS OF RESIST POLYMER, RESIST POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS

摘要

PROBLEM TO BE SOLVED: To provide a resist polymer which has high sensitivity and resolution and causes only a small number of defects and a small degree of line edge roughness upon development, when used for a resist composition in DUV excimer laser lithography or electron beam lithography, its manufacturing process, a resist composition containing the resist polymer and a patterning process using the resist composition.;SOLUTION: The manufacturing process of the resist polymer relates to the manufacture of a resist polymer containing (A) a constitutional unit at least having an acid-leaving group and involves a step to polymerize the monomer constituting the constitutional unit (A) using a polymerization initiator and a specific compound in which n pieces of the functional group [X-SH] having an acid-decomposing bond and polymerization-termination capability or chain-transfer capability are bonded in the place of J representing an n valent hydrocarbon group optionally having a substituent and/or a heteroatom.;COPYRIGHT: (C)2006,JPO&NCIPI