MONOMORS CAPABLE OF HAVING AN EXCELLENT TRANSPARENCY TO RADIATION WITH A WAVELENGTH OF LESS THAN 500 NM AND BEING USEFULLY USED AS THE RAW MATERIAL MONOMERS OF POLYMERS FOR MANUFACTURING THE BASE RESIN OF RADIATION-SENSITIVE RESIST MATERIALS HAVING AN EXCELLENT DEVELOPMENT CHARACTER, POLYMERS, RESIST COMPOSITIONS AND A PATTERNING PROCESS

摘要

PURPOSE: Monomers are provided to have high dissolution contrast in alkaline development and organic solvent development and provide the base resin of photoresist compositions with a high sensitivity.;CONSTITUTION: Monomers is represented by a chemical formula (1A) or (1B). Here, R^1 indicates hydrogen, a methyl group and a trifluoromethyl group. R^2 indicates a cyclic monovalent hydrocarbon group of C3-15. R^3 and R^4 respectively indicate a straight chained, branched or cyclic monovalent hydrocarbon group of C1-15. R^5 indicates a straight chained, branched or cyclic monovalent hydrocarbon group of C1-15. X^1 and X^2 respectively indicate a single bond or a straight chained or branched bivalent hydrocarbon group of C1-4. K^1 indicates an integer of 1-3. Z^1 indicates. Z^1 indicates a substituent of C5-15 which is formed with carbon atoms combined with the substituent.;COPYRIGHT KIPO 2013;[Reference numerals] (A) Coating photoresist; (B) Exposing photoresist to light; (C) Organic solvent development