Novel polymer for preparing resist underlayer film resist underlayer film composition containing the polymer and process for forming resist pattern using the composition

摘要

The present invention relates to a polymer with novel structures used in processes for preparing a semiconductor or a display, an underlayer film composition for preparing the semiconductor or the display comprising the polymer, and a process to form a resist pattern for preparing the same using the composition. More specifically, the novel polymer of the present invention has an optimized etch selectivity, planarization characteristics, and superior thermal resistance at the same time. Therefore, the underlayer film composition comprising the novel polymer can be utilized as a hard mask in a lithography process for the multilayer semiconductors.