Novel polymer for preparing resist underlayer film resist underlayer film composition containing the polymer and process for forming resist underlayer film using the composition

摘要

It is designed to provide the composition that a kind of polymer is used to be formed resist lower membrane, with excellent thermal stability, elching resistant, coats uniformity. The present invention relates to a kind of monomers of Novel Fluorene alcohol radical; By polymer to be used to form resist lower membrane, obtain identical using this; A kind of resist lower film composition includes polymer; And forming method uses the resist lower membrane of the resist lower membrane. Fluorenol base monomer is indicated by chemical formula 12. 2, R, R1 are equal to specified detailed description of the invention to R3, n and s in chemical formula. Resist lower film composition includes: the process that the polymer can be used to form resist lower membrane; And organic solvent. ;The 2016 of copyright KIPO submissions