Novel polymer for preparing resist underlayer film resist underlayer film composition containing the polymer and process for forming resist underlayer film using the composition

摘要

The present invention relates to a novel fluorenol-based monomer, a polymer for forming a resist underlayer film obtained therefrom, a resist underlayer film composition comprising the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, The monomer is represented by the following formula (2): [Formula 2] In Formula 2, R, R 1 to R 3 , n and s are as described in the detailed description of the invention.