Novel polymer for preparing resist underlayer film resist underlayer film composition containing the polymer and process for forming resist pattern using the composition

摘要

The present invention relates to for semiconductor and the structure novel of a display production a polymer, for an ingredient, identical for semiconductor and display production, with a kind of method, it is used to form for the resist pattern of semiconductor and the use of identical display fabrication process. Novel polymer of the invention optimized etch selectivity and planarization characteristics simultaneously, so that identical bottom film ingredient can be used as a dura mater in semiconductor stacking lithography process. ;Copyright KIPO 2017