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X-RAY DIFFRACTION ANALYZER AND X-RAY DIFFRACTION ANALYZING METHOD

机译:X射线衍射分析仪和X射线衍射分析方法

摘要

PROBLEM TO BE SOLVED: To provide an X-ray diffraction analyzing technique capable of simply acquiring the X-ray diffraction pattern equipped with the local structural data of a sample having a non-uniform crystal structure in a laboratory or on the spot by reducing the damping of intensity in a light path until the X-ray beam emitted from an X-ray tube arrives at a sample to the utmost.;SOLUTION: A position where the X-ray tube (9), which emits characteristic X rays of a predetermined element as incident X rays (8) for illuminating the fixed and held sample (1), is a position permitting the incident X rays (8) to irradiate the whole of the region (A) to be measured of the sample (1) and unlimitedly approaching the sample (1) within the non-contact range with the sample (1).;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种X射线衍射分析技术,该技术能够通过减少X射线衍射分析的方法,简单地获取配备有实验室或现场具有不均匀晶体结构的样品的局部结构数据的X射线衍射图。衰减光路中的强度,直到从X射线管发射的X射线束到达最大样本为止;解决方案:X射线管(9)发射特征X射线的位置作为用于照射固定并保持的样品(1)的入射X射线(8)的预定元素,是允许入射X射线(8)照射样品(1)的整个待测量区域(A)的位置。并且在与样品(1)的非接触范围内无限接近样品(1)。;版权所有:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006250646A

    专利类型

  • 公开/公告日2006-09-21

    原文格式PDF

  • 申请/专利权人 NATIONAL INSTITUTE FOR MATERIALS SCIENCE;

    申请/专利号JP20050066120

  • 发明设计人 SAKURAI KENJI;

    申请日2005-03-09

  • 分类号G01N23/207;

  • 国家 JP

  • 入库时间 2022-08-21 21:56:17

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