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X-RAY DIFFRACTION ANALYZER AND METHOD FOR CORRECTING MEASUREMENT POSITION OF X-RAY DIFFRACTION ANALYZER

机译:X射线衍射分析仪及X射线衍射分析仪的测量位置校正方法

摘要

PROBLEM TO BE SOLVED: To provide an X-ray diffraction analyzer and a method for correcting a measurement position of the X-ray diffraction analyzer, which can improve measurement accuracy when analyzing a crystal structure of a sample.;SOLUTION: The X-ray diffraction analyzer includes an X-ray generator; a first stage; a detector which detects X-rays diffracted by the sample; a second stage in which the detector is disposed; and a moving section which is disposed between the second stage and the detector and moves the detector so as to make the spacing adjustable between the sample and the detector. In the method for correcting the measurement position of the X-ray diffraction analyzer, which uses the X-ray diffraction analyzer, a diffraction angle 2θ is measured by continuously or intermittently detecting X-rays diffracted by the sample having a known crystal structure, and a value of variation in the spacing D2 between the sample and the detector by calculating errors between the lattice spacing of the sample and actual measurement values on the basis of the diffraction angle 2θ, and the position of the detector is adjusted in accordance with the value of variation in the spacing D2.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种X射线衍射分析仪和用于校正该X射线衍射分析仪的测量位置的方法,其可以在分析样品的晶体结构时提高测量精度。衍射分析仪包括X射线发生器;第一阶段;检测器,其检测由样品衍射的X射线;第二阶段,其中放置检测器;移动部分设置在第二台和检测器之间,并且移动检测器以使得样品和检测器之间的间隔可调。在使用X射线衍射分析仪的X射线衍射分析仪的测量位置的校正方法中,衍射角为2θ。通过连续地或间歇地检测由具有已知晶体结构的样品所衍射的X射线,通过计算晶格间距之间的误差来测量样品与检测器之间的间距D 2 的变化值样品和实际测量值根据衍射角2θ进行调整,并根据间距D 2 的变化值来调整检测器的位置。 )2005,日本特许厅

著录项

  • 公开/公告号JP2005121636A

    专利类型

  • 公开/公告日2005-05-12

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO LTD;

    申请/专利号JP20040256483

  • 发明设计人 LEE JONG-SIG;KIM KI-HONG;

    申请日2004-09-03

  • 分类号G01N23/20;G21K1/06;

  • 国家 JP

  • 入库时间 2022-08-21 22:37:17

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