NON-UNIFORMITY DEFECT INSPECTION MASK, APPARATUS AND METHOD FOR NON-UNIFORMITY DEFECT INSPECTION, AND METHOD FOR MANUFACTURING PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To detect non-uniformity defects appearing in a repeated pattern of the object for inspection with high accuracy.;SOLUTION: A plurality of repeated patterns 61 are formed in chips 65 as a unit on a transparent substrate 62, wherein the pattern 61 has a plurality of pseudo non-uniformity defects 66 which are allocated by stepwisely varying the intensity of non-uniformity defects for each kind of non-uniformity defects appearing in the predetermined repeated pattern 61. The non-uniformity defects are classified into: CD non-uniformity defects caused by abnormal line width of the unit pattern 63 in the repeated pattern, pitch non-uniformity defects caused by abnormality in the interval of the repeated pattern, butting non-uniformity defects caused by displacement of the repeated pattern, and figure-defect non-uniformity defects caused by a shape defect of the unit pattern of the repeated pattern.;COPYRIGHT: (C)2006,JPO&NCIPI