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Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence
Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence
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机译:用于执行基于模型的光学邻近度校正并将邻域影响分解的设备,方法和计算机程序产品
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摘要
Model Based Optical Proximity Correction (MOPC) biasing techniques may be utilized for optimizing a mask pattern. However, conventional MOPC techniques do not account for influence from neighboring features on a mask. This influence may be factored in the following manner—first, generating a predicted pattern from a target pattern and selecting a plurality of evaluation points at which biasing may be determined. Next, a set of multivariable equations are generated for each evaluation point, each equation representing influence of neighboring features on a mask. The equations are solved to determine that amount of bias at each evaluation point, and the mask is optimized accordingly. This process may be repeated until the mask pattern is further optimized.
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