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Ultra-high density storage device using phase change diode memory cells and methods of fabrication thereof

机译:使用相变二极管存储单元的超高密度存储装置及其制造方法

摘要

An ultra-high density data storage device using phase-change diode memory cells, and having a plurality of emitters for directing beams of directed energy, a layer for forming multiple data storage cells and a layered diode structure for detecting a memory or data state of the storage cells, wherein the device comprises a phase-change data storage layer capable of changing states in response to the beams from the emitters, comprising a material containing copper, indium and selenium. A method of forming a diode structure for a phase-change data storage array, having multiple thin film layers adapted to form a plurality of data storage cell diodes, wherein the method comprises depositing a first diode layer of material on a substrate, and depositing a second diode layer of phase-change material on the first diode layer, the phase-change material containing copper, indium and selenium.
机译:一种使用相变二极管存储单元的超高密度数据存储设备,该设备具有多个用于定向有向能量束的发射器,一个用于形成多个数据存储单元的层以及一个用于检测存储器的存储状态或数据状态的分层二极管结构存储单元,其中该设备包括相变数据存储层,该相变数据存储层能够响应于来自发射器的光束而改变状态,该相变数据存储层包括含有铜,铟和硒的材料。一种形成用于相变数据存储阵列的二极管结构的方法,该二极管结构具有适于形成多个数据存储单元二极管的多个薄膜层,其中该方法包括在衬底上沉积材料的第一二极管层,以及沉积材料的第一二极管层。在第一二极管层上的相变材料的第二二极管层,该相变材料包含铜,铟和硒。

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