ETCHING SOLUTION, ETCHED ARTICLE AND METHOD FOR ETCHED ARTICLE

摘要

An etching solution which contains hydrogen fluoride (HF) and exhibits an etching rate ratio: etching rate for a boron-glass film (BSG) or boron-phosphorusglass (BPSG)/etching rate for a thermally oxidized film (THOX) of 10 or more at 25 DEG C.