首页> 外国专利> SEMICONDUCTOR DEVICE, PATTERN LAYOUT DESIGNING METHOD, EXPOSURE MASK, MASK PATTERN DESIGINING METHOD,SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND LAYOUT DESIGINING METHOD

SEMICONDUCTOR DEVICE, PATTERN LAYOUT DESIGNING METHOD, EXPOSURE MASK, MASK PATTERN DESIGINING METHOD,SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND LAYOUT DESIGINING METHOD

机译:半导体器件,图案布局设计方法,曝光掩模,掩模图案设计方法,半导体器件制造方法和布局设计方法

摘要

A semiconductor device includes a semiconductor substrate, and a circuit pattern group comprising at least N (=2) circuit patterns on the semiconductor substrate, at least one vicinity of end portion among the at least of N circuit patterns including a connection area to electrically connect to a circuit pattern in another circuit pattern group different from the circuit pattern group, the at least N wirings pattern including a circuit pattern N 1 and at least one circuit pattern Ni (i=2) arranged in one direction different from longitudinal direction of the circuit pattern N 1, the at least one circuit patterns Ni having larger i being arranged at further position away from the circuit pattern N 1, and in terms of a pattern including the connection area among the at least of Ni circuit patterns, the larger the i, the connection area being arranged at a further position in longitudinal direction.
机译:一种半导体器件,包括:半导体衬底;以及电路图案组,该电路图案组包括在半导体衬底上的至少N(> = 2)个电路图案,至少N个电路图案中的端部的至少一个附近包括与电连接的连接区域。连接至不同于该电路图案组的另一电路图案组中的电路图案,该至少N个布线图案包括沿与纵向不同的一个方向布置的电路图案N 1和至少一个电路图案Ni(i> = 2)在电路图案N 1中,至少一个具有较大的i的电路图案Ni布置在远离电路图案N 1的另一位置处,并且就包括至少Ni个电路图案中的连接区域的图案而言, i越大,连接区域在纵向方向上布置在另一位置。

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