首页> 外国专利> P-TYPE GaN HAVING HIGH ELECTRIC CONDUCTIVITY AND LOW OHMIC CONTACT RESISTANCE AND METHOD FOR PREPARING THE SAME

P-TYPE GaN HAVING HIGH ELECTRIC CONDUCTIVITY AND LOW OHMIC CONTACT RESISTANCE AND METHOD FOR PREPARING THE SAME

机译:具有高电导率和低欧姆接触电阻的p型GaN及其制备方法

摘要

the present invention is a p-type GaN layer grown upon the p-type dopant and the doping with Al by Al including p-type GaN layer and a method for producing characterized in that it and to provide a GaN-based device including a p-type GaN layer of the present invention . If the p-type GaN layer of the present invention is excellent in electrical conductivity , and the like used in the production of an ohmic contact resistance is small , because the light-emitting diode or laser diode can reduce the series resistance of the device .
机译:本发明是一种在p型掺杂剂上生长的p型GaN层以及包括p型GaN层的Al掺杂Al的制造方法,其特征在于,提供一种包括p型GaN层的GaN基器件。本发明的GaN型GaN层。如果本发明的p型GaN层的导电性优异,则在欧姆接触电阻的生产中使用的类似物较小,这是因为发光二极管或激光二极管可以减小器件的串联电阻。

著录项

  • 公开/公告号KR100581770B1

    专利类型

  • 公开/公告日2006-05-22

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20030096475

  • 发明设计人 이재승;이정희;

    申请日2003-12-24

  • 分类号H01L33/00;

  • 国家 KR

  • 入库时间 2022-08-21 21:23:48

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