LITHOGRAPHIC APPARATUS AND METHOD FOR OPTIMIZING AN ILLUMINATION SOURCE USING PHOTOLITHOGRAPHIC SIMULATIONS

摘要

A method of optimizing an illumination condition by computer simulation of a lithographic apparatus, wherein the lithographic apparatus includes an illuminator and a projection system, the method comprising: defining a lithographic pattern to be printed on a substrate; Selecting a simulation model; Selecting a grid point of the source in a pupil plane of the illuminator; Calculating a separate response value for the individual source points; And a step of adjusting the illumination configuration based on the analysis of the accumulated result value of said separate output values, each of said response values ​​indicate the results of a single or a series of simulation using the simulation model.