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Lithographic apparatus and method for optimizing an illumination source using photolithographic simulations
Lithographic apparatus and method for optimizing an illumination source using photolithographic simulations
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机译:使用光刻模拟来优化照明源的光刻设备和方法
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摘要
A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation, the lithographic apparatus including an illuminator and a projection system, includes defining a lithographic pattern to be printed on the substrate, selecting a simulation model, selecting a grid of source points in a pupil plane of the illuminator, calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the simulation model, and adjusting an illumination arrangement based on analysis of accumulated results of the separate calculations.
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