SILICON-CONTAINING PHOTOSENSITIVE COMPOSITION, METHOD FOR PRODUCING THIN FILM PATTERN USING SAME, PROTECTIVE FILM FOR ELECTRONIC DEVICE, TRANSISTOR, COLOR FILTER, ORGANIC EL DEVICE, GATE INSULATING FILM AND THIN FILM TRANSISTOR

摘要

PROBLEM TO BE SOLVED: To provide a silicon-containing photosensitive composition which has photosensitivity, can be developed in a short time and makes it possible to form a thin film pattern free of coloration resulted from the photosensitive composition, a method for producing a thin film pattern using the same, a protective film for an electronic device, a transistor, a color filter, an organic EL device, a gate insulating film and a thin film transistor.;SOLUTION: The silicon-containing photosensitive composition contains at least one silicon-containing polymer having an SiH group and a compound which generates an acid or a base upon irradiation with light or radiation, wherein the silicon-containing polymer is obtained by polymerizing at least one silane compound (A) having two hydrolyzable groups represented by a formula (1): SiH_p(X)₂(R₁)_2-p. The silane compound (A) includes a silane compound having an SiH group. In the formula (1), X represents a hydrolyzable group; R₁ represents a 1-30C non-hydrolyzable organic group; p represents an integer of 0-2, when p is 0, two symbols R₁ may be the same or different, and two symbols X may be the same or different.;COPYRIGHT: (C)2008,JPO&INPIT