首页> 外国专利> CREATING AND APPLYING VARIABLE BIAS RULE IN RULE-BASED OPTICAL PROXIMITY CORRECTION FOR REDUCED COMPLEXITY

CREATING AND APPLYING VARIABLE BIAS RULE IN RULE-BASED OPTICAL PROXIMITY CORRECTION FOR REDUCED COMPLEXITY

机译:在基于规则的光学邻近度校正中创建和应用可变偏差规则以降低复杂性

摘要

PROBLEM TO BE SOLVED: To provide an optical proximity correction (OPC) based integrated circuit (IC) design system and method for applying specified correction rules in rule-based OPC, that is more fracture-friendly and generates simpler OPC output, without significantly compromising accuracy.;SOLUTION: The optical proximity correction (OPC) based integrated circuit design system and method introduce a variable rule where the rules are specified in terms of multiple correction actions that yield acceptable results, but this category of rules provides more degrees of freedom in actual application so that the rule-based OPC tool can intelligently select the proper valid rule that minimizes the OPC complexity or meets other objectives.;COPYRIGHT: (C)2007,JPO&INPIT
机译:要解决的问题:提供一种基于光学接近校正(OPC)的集成电路(IC)设计系统和方法,以在基于规则的OPC中应用指定的校正规则,该方法更易于破坏并且生成更简单的OPC输出,而不会显着降低性能解决方案:基于光学邻近校正(OPC)的集成电路设计系统和方法引入了可变规则,其中根据产生可接受结果的多个校正动作来指定规则,但是此类规则在以下方面提供了更大的自由度:实际应用,以便基于规则的OPC工具可以智能地选择适当的有效规则,以最小化OPC复杂性或满足其他目标。;版权所有:(C)2007,JPO&INPIT

著录项

  • 公开/公告号JP2007102207A

    专利类型

  • 公开/公告日2007-04-19

    原文格式PDF

  • 申请/专利权人 TAKUMI TECHNOLOGY CORP;

    申请/专利号JP20060243600

  • 发明设计人 ZHANG YOUPING;

    申请日2006-09-08

  • 分类号G03F1/08;G06F17/50;

  • 国家 JP

  • 入库时间 2022-08-21 21:12:56

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