Method and the device in order to create extreme ultraviolet radiation emission or soft x-ray emission

摘要

Topic Under, although a better economic condition in the spectrum range of approximately 13.5nm use to EUV lithography it is made possible without necessary to increase the electric power of the device which is used in order to form the plasma largely the high pliability where the device is adjusted to the needs of specification of the user is offered.SolutionsThe extreme ultraviolet radiation (EUV) or the device which generates soft x-ray emission, has with the electrode which is located around route of the plasma which in order to form the laser radiation which was focused to the target at the strength which exceeds 106 W/cm2 in order to form the plasma is formed with laser source and laser source. The electrode has connected with the expedient in order to form the urgent discharge which possesses the specific time constant which is smaller than time constant of laser formation plasma expansion time in the plasma.