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Low voiding no flow fluxing underfill for electronic devices

机译:电子设备的低空洞无助焊剂底部填充

摘要

A no flow fluxing underfill having a hardener component comprising a phenolic component and an anhydride component in a molar ratio of phenolic component to anhydride component of between about 0.1:1 and about 2:1; or between about 0.8:1 and about 1.2:1. An underfill preparation method involving blending an epoxy component and a phenolic component, heating the blend, and cooling the blend, prior to incorporation of an anhydride component.
机译:一种不流动助焊剂底部填充料,其具有包含酚组分和酸酐组分的硬化剂组分,所述酚组分与酸酐组分的摩尔比为约0.1∶1至约2∶1;或介于约0.8:1至约1.2:1之间。底部填充剂的制备方法,包括在掺入酸酐组分之前,将环氧组分和酚醛组分共混,加热共混物,并冷却共混物。

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