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methods for fabricating a structured hard chrome layer and a coating, structured hard chrome layer, structured hard chrome layer and electrolyte
methods for fabricating a structured hard chrome layer and a coating, structured hard chrome layer, structured hard chrome layer and electrolyte
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机译:结构化硬铬层和涂层的制造方法,结构化硬铬层,结构化硬铬层和电解质
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摘要
"METHODS FOR MANUFACTURING A STRUCTURED HARD CHROME LAYER AND A COATING, STRUCTURED HARD CHROME LAYER, STRUCTURED HARD CHROME LAYER". The present invention relates to a method for fabricating structured hard chromium layer, wherein chromium extracted from an electrolyte is deposited on a workpiece, which contains: (a) compound CR (VI) in an amount corresponding to 50 300 g / l chromic acid anhydride; (b) 0.5 to 10 g / l sulfuric acid; (c) 5 g / 1 to 15/1 aliphatic sulfonic acid of 1 to 6 carbon atoms; whereas the electrolyte contains essentially no compounds selected from ammonium molybdate, alkaline molybdate and alkaline earth molybdate, alkaline and alkaline earth vanadate and ammonium zirconate, and is worked with a current density 12% or less. In addition, a method of fabricating a coating, a structured hard chrome layer, a coating and an electrolyte is indicated.
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机译:“制造结构化硬铬层和涂层,结构化硬铬层,结构化硬铬层的方法”。本发明涉及一种结构化硬铬层的制造方法,其中将从电解质中提取的铬沉积在工件上,该工件含有:(a)化合物CR(VI)的量对应于50 300 g / l铬酸酐; (b)0.5至10克/升硫酸; (c)5克/ 1至15/1个碳原子数为1至6的脂族磺酸;而该电解质基本上不包含选自钼酸铵,碱金属钼酸盐和碱土金属钼酸盐,碱金属和碱土金属钒酸盐和锆酸铵的化合物,并且在12%或更低的电流密度下工作。另外,显示了一种制造涂层,结构化硬铬层,涂层和电解质的方法。
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