首页> 外国专利> Process for manufacturing a phase change memory array in Cu-damascene technology and phase change memory array manufactured thereby

Process for manufacturing a phase change memory array in Cu-damascene technology and phase change memory array manufactured thereby

机译:以铜镶嵌技术制造相变存储器阵列的方法和由此制造的相变存储器阵列

摘要

A process for manufacturing a phase change memory array, includes the steps of: forming a plurality of PCM cells (33), arranged in rows and columns; and forming a plurality of resistive bit lines (35) for connecting PCM cells (33) arranged on a same column, each resistive bit lines (35) comprising a respective phase change material portion (31'), covered by a respective barrier portion (32'). After forming the resistive bit lines (35), electrical connection structures (45, 52) for the resistive bit lines (35) are formed directly in contact with the barrier portions (32') of the resistive bit lines (35).
机译:一种用于制造相变存储器阵列的方法,包括以下步骤:形成以行和列排列的多个PCM单元(33);以及形成多个PCM单元(33)。并形成用于连接布置在同一列上的PCM单元(33)的多条电阻位线(35),每条电阻位线(35)包括相应的相变材料部分(31'),并被相应的势垒部分( 32')。在形成电阻位线(35)之后,形成用于电阻位线(35)的电连接结构(45,52),使其直接与电阻位线(35)的势垒部分(32′)接触。

著录项

  • 公开/公告号EP1505656B1

    专利类型

  • 公开/公告日2007-01-03

    原文格式PDF

  • 申请/专利权人 ST MICROELECTRONICS SRL;

    申请/专利号EP20030425536

  • 发明设计人 PELLIZZER FABIO;BEZ ROBERTO;

    申请日2003-08-05

  • 分类号H01L27/24;

  • 国家 EP

  • 入库时间 2022-08-21 20:49:00

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号