INTEGRATED CIRCUIT DESIGN METHOD, DESIGN SUPPORT PROGRAM USED IN THE INTEGRATED CIRCUIT DESIGN METHOD, AND INTEGRATED CIRCUIT DESIGN SYSTEM

摘要

[PROBLEMS] To provide an integrated circuit design method, a design support program used in the integrated circuit design method, and an integrated circuit design system which realize a combined method of the photo mask-less experimental manufacture method and the photo mask experimental manufacture method having the advantage of the photo mask-less experimental manufacture method which can perform experimental manufacture without producing a photo mask and the advantage of the photo mask experimental manufacture method enabling direct use of the pattern information used in the experimental manufacture in the mass production. [MEANS FOR SOLVING PROBLEMS] In a common design environment usable for a photo mask-less process for creating an integrated circuit without using a photo mask according to pattern information and a photo mask process for creating an integrated circuit by using a photo mask according to the pattern information, according to the pattern information for experimental manufacture corresponding to the photo mask-loess process and the photo mask process, an integrated circuit is experimentally manufactured without using a photo mask, evaluated, improved if necessary, and formally converted without adding improvement to the common pattern information, thereby generating a photo mask for mass production and using it.