MULTILAYER REFLECTIVE FILM COATED SUBSTRATE, MANUFACTURING METHOD THEREOF, REFLECTIVE MASK BLANK, AND REFLECTIVE MASK

摘要

A multilayer reflective film coated substrate of the present invention includes a multilayer reflective film comprising a film Mo / Si alternately laminated multi-layer bottom film for reflecting the exposure light containing film Mo / Si alternately laminated. The lower multilayer film and the multilayer reflection film are formed in sequence on a substrate. The lower multilayer film cycle with a length of bottom d (unit: nm) and the multilayer reflective film of the top cycle with a length of d (unit: nm) as given, the, bottom d d of the case top, ; (N + 0.15) xd top ≤ d bottom ≤ (n + 0.9) xd top ; And satisfying the relation of a given formula (1) with, where n is a natural number of 1 or more.