SUBSTRATE FOR MASK BLANK SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE TYPE MASK BLANK REFLECTIVE TYPE MASK MANUFACTURING METHOD OF SUBSTRATE FOR MASK BLANK AND MANUFACTURING METHOD OF SUBSTRATE WITH MULTILAYER REFLECTIVE FILM AS WELL AS MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

摘要

An object of the present invention is to provide a mask blank substrate and the like which can reliably detect a critical defect with a small number of detections including pseudo defects even in a high-sensitivity defect checker using light of various wavelengths. The present invention relates to a substrate for a mask blank used for lithography, wherein an area of 0.14 mm x 0.1 mm on the main surface of the substrate on which the transfer pattern of the mask blank is formed is detected with a white interferometer at a number of pixels of 640 x 480 Space Frequency 1 10^-2m^-OneMore than 1 m^-OneThe power spectral density is 4 x 10 ⁶nm⁴Or less and a spatial frequency of 1 mu m detected in a region of 1 mu m x 1 mu m^-OneWhen the power spectrum density is 10 nm⁴Or less of the mask blank.;